Contact Resistance between Si and AuGeSb/Cr/NiCr/Ni Films.
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چکیده
منابع مشابه
Contact Resistance in Schottky Contact Gated-Four-Probe a-Si Thin-Film Transistor
The source and drain electrode contact resistance of the hydrogenated amorphous silicon (a-Si:H) thin-film transistor (TFT) with a Schottky-barrier source/drain contact was measured using a gated-four-probe TFT structure. Typically its variation with the gate bias is considered to be independent of the gate bias but we observed that contact resistances decrease exponentially with increasing gat...
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Michael Hermele,1 Gil Refael,2 Matthew P. A. Fisher,3 and Paul M. Goldbart4 1Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA 2Department of Physics, California Institute of Technology, Pasadena, California 91125, USA 3Kavli Institute for Theoretical Physics, University of California, Santa Barbara, California 93106, USA 4Department of Physics, U...
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ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1991
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.42.1158